
Datasheet summary
WBMP OH
PDF datasheet mirror for WBMP OH (ResinTech). Verify with OEM before design.
Summary
Product Identification
- Product Name: WBMP-OH
- Product Line: ResinTech
- Type: WEAK BASE ANION
- Functional Group: Dimethylamine
- Ionic Form: Hydroxide
- Polymer Matrix: Styrenic Macroporous
- Physical Form: Spherical Beads
Typical Properties & Physical Characteristics
- Particle Size: 16 to 50 US Mesh (297 - 1190 μm)
- % < 50 mesh (300µm): < 1%
- Minimum Sphericity: 95%
- Uniformity Coefficient: 1.6
- Reversible Swelling (OH to HCl): 10% to 15%
- Temperature Limit: 250°F (121°C)
- Capacity (meq/mL): 1.3
- Moisture Retention: 53% to 60%
- Shipping Weight: 39 - 41 lbs/ft³ (625 - 657 g/L)
- Color: White to Tan
- Regenerability: Yes
Packaging Options
- 1 ft³ bags
- 1 ft³ boxes
- 1 ft³ drums
- 7 ft³ drums
- 42 ft³ supersacks
Applications
- Cartridge Applications
- Demineralizer systems, often in conjunction with strong acid cation and strong base anion resins.
Suggested Operating Conditions
- Maximum continuous temperature: 212°F
- Minimum bed depth: 24 inches
- Backwash expansion: 25 to 50 percent
- Maximum pressure loss: 20 psi
- Operating pH range: <9 SU
Regeneration (Hydroxide cycle)
-
Regenerant Concentration: 1 to 6 percent NaOH
-
Regenerant level: 3 to 6 lbs./cu.ft.
-
Regenerant flow rate: 0.5 to 1.0 gpm/cu.ft.
-
Regenerant contact time: >30 minutes
-
Displacement flow rate: Same as dilution water
-
Displacement volume: 10 to 15 gallons/cu.ft.
-
Rinse flow rate: Same as service flow
-
Rinse volume: 35 to 60 gallons/cu.ft.
-
Service flow rate: 1 to 4 gpm/cu.ft.
Backwash Expansion Data
See the official PDF for exact tabulated values of expansion (percent) versus flow rate (gpm/sq.ft.) at different temperatures.
Pressure Loss Data
See the official PDF for exact tabulated values of pressure loss (psi/ft. of Resin) versus flow rate (gpm/sq.ft.) at different temperatures.
Organic Removal
ResinTech WBMP-OH can remove organic acid anions and is regenerated with sodium hydroxide. It can be used to reduce organic fouling of strong base anion resins in demineralization applications. The feedwater must be acidic or the resin preconverted to the acid sulfate or acid chloride form.
Demineralizer Use
WBMP-OH can be used in two-bed systems after a strong acid cation unit for applications where complete removal of silica and carbon dioxide is not required. It can also precede a strong base anion unit to remove strong acids, leaving silica and carbon dioxide for the strong base resin. Regeneration is effective with modest caustic dosages.
Disclaimer: Extraction may miss figures, footnotes, or revisions; contractual data must match the OEM PDF revision used on the project.
Official datasheet (PDF)
Curated from selected public technical reference material for discovery and preliminary comparison. This summary is not a substitute for a current certified manufacturer datasheet. Verify revisions and design limits before use.