Datasheet summary
UPHR1
PDF datasheet mirror for UPHR1 (Samyang Trilite). Verify with OEM before design.
Summary
Product identification
TRILITE® UPHR1 is a product for the removal of hydrogen peroxide (H₂O₂) and anions generated by TOC-UV treatment. It is used in the post-polishing stage of the semiconductor ultrapure water process to stabilize and extend the lifespan of the polishing system.
Physical and Chemical Properties
- Matrix: Styrene-DVB, Gel
- Functional group:
- SAC: H⁺
- SBA: OH⁻
- Ionic form: H⁺ / OH⁻
- Particle Size (µm): 1.9
- Uniformity coefficient: 1.1↓
- Ionic Conversion (%):
- H⁺: 99.0 Min
- OH⁻: 95.0 Min
- Cl⁻: 1.0 Max
Operating limits
- Operating Temp (°C): 60
- pH Range: 0~14
- Bed Depth (mm): 600
- Service Flow Rate (m/h): 5~60
Feed water
- Inlet condition: Ultrapure water, Resistivity > 18.2 ㏁·cm, TOC < 1 ppb, SV10
Product water
- Outlet condition: Guaranteed 18.2 ㏁·cm ↑ (in 24 hr.)
Applications
TRILITE® UPHR1 is used for the removal of hydrogen peroxide (H₂O₂) and anions generated by TOC-UV treatment in the semiconductor ultrapure water process.
Disclaimer: This extraction may miss figures, footnotes, or revisions; contractual data must match the OEM PDF revision used on the project.
Official datasheet (PDF)
Curated from selected public technical reference material for discovery and preliminary comparison. This summary is not a substitute for a current certified manufacturer datasheet. Verify revisions and design limits before use.