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Datasheet summary

Mega Etch Filters

Engineering summary from PDF text extraction for Mega Etch Filters. Verify every value with the OEM datasheet.

Summary

Product identification

The Mega-Etch Filter is designed for use in recirculating etch baths. It utilizes a patented asymmetric polysulfone membrane to provide high flow, low-pressure drop, fast bath clean-up, and long service life. It does not require IPA pre-wetting.

Benefits

  • Available in retention ratings of 0.05, 0.1, 0.2, 0.45 µm
  • High flow vs. low-pressure drop
  • No pre-wetting with IPA required
  • Fast bath clean-up
  • Patented highly asymmetric polysulfone membrane assures long life

Operating limits

  • Maximum Operating Temperature: 203˚F / 95˚C
  • Maximum Forward Differential Pressure: 50 psid @ 60˚F / 3.45 bar @ 20˚C

Mechanical / hydraulic

Materials

  • Medium: Highly asymmetric hydrophilic polysulfone
  • Hardware: Polypropylene
  • Support: Polypropylene
  • O-ring: Viton A (standard)

Removal Ratings

  • 0.45 µm (0.1 µm RP₂)
  • 0.2 µm
  • 0.1 µm
  • 0.05 µm
  • The 0.45 µm (EBC450) cartridge has a Recirculating Performance of 0.1 µm.

Filter Areas

  • 10" / 254 mm: 7.0 ft.² / 0.65 m²
  • 20" / 508 mm: 14.0 ft.² / 1.30 m²

Configurations

  • Nominal Length: 10" / 25.4 cm, 20" / 50.8 cm
  • Diameter: 2.6" / 6.6 cm

Performance Parameters

Mega-Etch cartridges are available in single pass ratings of 0.05, 0.1, 0.2, or 0.45 µm. Clean pressure drop versus liquid flow rate (water) data is available in a graphical format in the official PDF for 0.05 µm, 0.1 µm, 0.2 µm, and 0.45 µm cartridges. For liquids with viscosity differing from water, multiply the pressure drop by the viscosity in centipoise.

Target Applications

The Mega-Etch cartridge is recommended as the primary filter in recirculating etch baths. When operated at ambient temperature, it is compatible with a wide variety of etch solutions and highly recommended for use in SiO₂ Etch with surfactant and low horsepower internal pumps. It is also recommended for use in semi-aqueous strippers that are primarily HF based.

Note: The Mega-Etch cartridge will pressure wet when used in SiO₂ Etch without surfactant and with higher horsepower pumps.

Part Numbers / Ordering Information

The EBC series cartridges are specified by a combination of codes:

  • Removal Ratings (Code in µm)
    • 050: 0.05
    • 100: 0.1
    • 200: 0.2
    • 450: 0.45 (0.1 RP₂)
  • Cartridge Lengths (Code)
    • 10: 10" / 254 mm
    • 20: 20" / 508 mm
  • End Configurations (Code)
    • M3: SOE flat closed end, external 222 O-rings
    • M7: SOE fin end, external 226 O-rings
    • M8: SOE fin end, external 222 O-rings
  • O-Ring Materials (Code)
    • V: Viton A (standard)
    • T: FEP Encapsulated Silicone
    • F: FEP Encapsulated Viton A
    • C: Chemraz

Disclaimer: This summary is based on the provided text extract. It may not include all figures, footnotes, or the most recent revisions. For contractual data, please refer to the official OEM PDF revision used on your project.

Official datasheet (PDF)

Lenntech datasheet mirror

Curated from selected public technical reference material for discovery and preliminary comparison. This summary is not a substitute for a current certified manufacturer datasheet. Verify revisions and design limits before use.